The Laboratory is an ISO 5 clean room that includes facilities for Photolithography processes.
The fabrication set consists in a Mask Aligner, with Bottom Side Alignment option and a maximum resolution of 0.4 μm for lines and 0.6 μm for holes , an automatized coating system, with spin coater and hot plate, and a vertical laminar flow wet bench for developing steps.
|UV & Nanoimprinting Lithography|
|CLEAN ROOM ISO 5 (100 CLASS)|
MJB4 Mask Aligner (from SUSS MicroTec)
The UV lithography system has the following features:
The system is equipped also with a NIL module, allowing UV printing at the nano-scale level. UV-NIL is a low-cost production technology that is based on UV-curing, developed as a cost-effective alternative to high-resolution e-beam lithography. An easy and fast switching between UV-lithography and UV-NIL allows to combine these processing technique. UV-NIL can be performed on sample up to 2" in size, with a best resolution of lower than 100 nm.
A spinning system for sample coating with photoresist film, up to 6" sample is available, together also with an hot plate (160x160 mm) up to 325 °C.
Contact person: Prof. Salvo Mirabella